Title:
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND COMPOUND
Document Type and Number:
Japanese Patent JP2020132867
Kind Code:
A
Abstract:
To provide a resin that makes it possible to produce a resist pattern having excellent CD uniformity (CDU), and a resist composition containing the same.SOLUTION: A resin contains a structural unit represented by formula (I) and a structural unit represented by formula (a2-A).SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
FUJITA SHINGO
ICHIKAWA KOJI
FUJITA SHINGO
ICHIKAWA KOJI
Application Number:
JP2020018805A
Publication Date:
August 31, 2020
Filing Date:
February 06, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F220/18; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation