Title:
ELECTRON BEAM DEVICE AND IMAGE PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2020155374
Kind Code:
A
Abstract:
To provide an electron beam device in which, even when a shift amount becomes a sub-pixel amount, changes in a length measurement value due to the moving of an image can be prevented.SOLUTION: In an electron beam device and an image processing method, a correction image is obtained by performing: a sub-pixel shift processing for shifting an image by a pixel shift amount between pixels by means of a pixel interpolation filter; and a frequency correction processing for correcting the frequency characteristics of an image after having been shifted.SELECTED DRAWING: Figure 6
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Inventors:
HAMADA KOICHI
SAKAI KEI
YAMAGUCHI SATOSHI
SAKAI KEI
YAMAGUCHI SATOSHI
Application Number:
JP2019054942A
Publication Date:
September 24, 2020
Filing Date:
March 22, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP
International Classes:
H01J37/22; G06T1/00; G06T7/168; H01J37/28; H01L21/66
Domestic Patent References:
| JP2016139466A | 2016-08-04 | |||
| JP2012151053A | 2012-08-09 | |||
| JP2006139965A | 2006-06-01 |
Foreign References:
| WO2010070815A1 | 2010-06-24 | |||
| WO2012111054A1 | 2012-08-23 | |||
| US6194718B1 | 2001-02-27 | |||
| US20130301954A1 | 2013-11-14 | |||
| US20060108525A1 | 2006-05-25 | |||
| US20110249110A1 | 2011-10-13 |
Attorney, Agent or Firm:
Aoritsu patent business corporation