Title:
VAPOR DEPOSITION MASK
Document Type and Number:
Japanese Patent JP2020158887
Kind Code:
A
Abstract:
To provide a vapor deposition mask having a configuration of supporting the mask main body by a frame and capable of achieving a large size of the vapor deposition mask while suppressing increase in manufacturing cost, maintaining the flatness of the vapor deposition mask and obtaining excellent reproduction accuracy and vapor deposition accuracy.SOLUTION: A vapor deposition mask comprises: a mask main body 2 including a vapor deposition pattern 6 consisting of a lot of independent vapor deposition through holes 5; and a reinforcement frame 3 arranged around so as to surround the mask main body 2 and consisting of a metal plate material having a low thermal linear expansion coefficient. The mask main body 2 and the frame 3 are inseparably bonded through a metal layer 8; the frame 3 is constituted of an upper frame 16 and a lower frame 17; and the upper and lower frames 16 and 17 are bonded and integrated through an adhesive layer 18.SELECTED DRAWING: Figure 13
Inventors:
TAMARU HIROHITO
KOBAYASHI YOSHIHIRO
ISHIKAWA KIICHIRO
KOBAYASHI YOSHIHIRO
ISHIKAWA KIICHIRO
Application Number:
JP2020106672A
Publication Date:
October 01, 2020
Filing Date:
June 22, 2020
Export Citation:
Assignee:
MAXELL HOLDINGS LTD
International Classes:
C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| JP2004349086A | 2004-12-09 | |||
| JP2002083679A | 2002-03-22 | |||
| JP2015200019A | 2015-11-12 |