Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020183375
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the acid generator.SOLUTION: A salt represented by formula (I) and a resist composition containing the same are provided. [In the formula (I), Q1 and Q2 each independently represent a fluorine atom or the like; R1 and R2 each independently represent a hydrogen atom or the like; z represents an integer of 0-6; when z is 2 or more, a plurality of R1's and R2's may be the same as or different from each other; X1 and X2 each independently represent *-CO-O- or the like; L1 represents a single bond or an optionally substituted C1-28 hydrocarbon group or the like; A1 represents an optionally substituted C3-36 lactone ring; L2 represents a single bond or a C1-6 alkanediyl group; R3 represents a C1-18 hydrocarbon group having an iodine atom, or the like; and Z+ represents an organic cation.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
YAMAGUCHI NORIFUMI
ICHIKAWA KOJI
YAMAGUCHI NORIFUMI
ICHIKAWA KOJI
Application Number:
JP2020074864A
Publication Date:
November 12, 2020
Filing Date:
April 20, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D307/00; C07C381/00; C08F20/18; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation