Title:
SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021038204
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern with excellent line edge roughness and a resist composition including the salt.SOLUTION: The present invention relates to a salt represented by formula (I), a quencher and a resist composition comprising the same [R1-R4 each denote halogen, a C1-6 fluorinated alkyl group or a C1-18 hydrocarbon group or the like; m1-m4 each denote an integer of 0-4; when m1-m4 are 2 or more, a plurality of R1-R4 may be the same or different].SELECTED DRAWING: None
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Inventors:
KOMURO KATSUHIRO
TAKAHASHI YUKI
ICHIKAWA KOJI
TAKAHASHI YUKI
ICHIKAWA KOJI
Application Number:
JP2020142042A
Publication Date:
March 11, 2021
Filing Date:
August 25, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D339/08; C08F212/08; C08F220/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation