Title:
POLISHING PAD AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2021053766
Kind Code:
A
Abstract:
To prevent falling off of a window for end point detection from a polishing layer at the time of polishing of a polished object.SOLUTION: A polishing layer 3c having a window 3B for end point detection is manufactured in the following way. First a polymer and a curing agent formed into the window for end point detection are mixed and then the mixture is poured into a mold 99 and a columnar base material 100 is prepared by (Fig. 4(a)). Subsequently, coarseness of an outer peripheral surface of the columnar base material 100 is adjusted, and a plurality of unevennesses is formed on the outer peripheral surface (Fig. 4(b)). Subsequently, in a state in which the columnar base material 100 is stored in a form 101, the mixture obtained by mixing a prepolymer and the curing agent is poured into the form 101 and is solidified, and a polyurethane polyurea resin molding 102 is prepared (Fig. 4(c)). Subsequently, when the polyurethane polyurea resin molding 102 is horizontally cut into required thickness and a sheet-like member 103 is prepared, the sheet-like member 103 is formed into a polishing layer (3C) having the window (3B) for end point detection (Fig. 4(d)).SELECTED DRAWING: Figure 4
Inventors:
MATSUOKA RYUMA
KURIHARA HIROSHI
NARUSHIMA SATSUKI
TAKAMIZAWA YAMATO
KURIHARA HIROSHI
NARUSHIMA SATSUKI
TAKAMIZAWA YAMATO
Application Number:
JP2019180494A
Publication Date:
April 08, 2021
Filing Date:
September 30, 2019
Export Citation:
Assignee:
FUJIBO HOLDINGS INC
International Classes:
B24B37/24; B24B37/013; C08G18/10; C08J5/14; H01L21/304
Attorney, Agent or Firm:
Makoto Kanzaki
Shinichiro Kanzaki
Shinichiro Kanzaki