Title:
POLYMER, METHOD FOR PRODUCING POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND CURED PRODUCT
Document Type and Number:
Japanese Patent JP2021063222
Kind Code:
A
Abstract:
To provide a polymer for being used in a photosensitive resin composition which has good sensitivity, has high alkali solubility and is excellent in developability, and a method for producing the same.SOLUTION: A copolymer composed of a structural unit represented by formula (NB) and a maleic acid anhydride structural unit is reacted with a compound having a hydroxyl group and a (meth)acryloyl group in the presence of a basic catalyst, and a polymer having a structural unit by ester exchange with the maleic acid anhydride structural unit and a structural unit by a hydrolyzable group of the maleic acid anhydride structural unit site is obtained.SELECTED DRAWING: None
Inventors:
TANABE JUNICHI
Application Number:
JP2020171021A
Publication Date:
April 22, 2021
Filing Date:
October 09, 2020
Export Citation:
Assignee:
SUMITOMO BAKELITE CO
International Classes:
C08F8/14; C08F222/06; C08F232/04; G02B5/20; G03F7/038
Attorney, Agent or Firm:
Shinji Hayami