Title:
POLISHING METHOD, POLISHING AGENT, AND POLISHING DETERGENT
Document Type and Number:
Japanese Patent JP2021151670
Kind Code:
A
Abstract:
To provide a polishing method through use of a polishing agent that can vary in properties in each step of polishing.SOLUTION: A polishing method of an embodiment includes the steps of: causing a to-be-polished surface 5a of a polishing target 5 to face a polishing cloth 2 and holding the polishing target 5; supplying a polishing agent to a space between the to-be-polished surface 5a and the polishing cloth 2; and rotating at least one of the polishing target 5 and the polishing cloth 2 to polish the to-be-polished surface 5a using the polishing agent. The polishing agent contains polishing grains, and an organic polymer that performs a phase transition reversibly between a gel state and a sol state depending on the temperature.SELECTED DRAWING: Figure 1
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Inventors:
SAKASHITA MIKIYA
KATAOKA YUMIKO
MATSUI YUKITERU
KATAOKA YUMIKO
MATSUI YUKITERU
Application Number:
JP2020052315A
Publication Date:
September 30, 2021
Filing Date:
March 24, 2020
Export Citation:
Assignee:
KIOXIA CORP
International Classes:
B24B37/00; B24B37/015; B24B55/06; C09K3/14; H01L21/304
Attorney, Agent or Firm:
Patent Business Corporation Sakura International Patent Office