Title:
FORMATION METHOD OF PATTERN FILM, PATTERN FILM AND ARTICLE
Document Type and Number:
Japanese Patent JP2021156946
Kind Code:
A
Abstract:
To provide a formation method of a pattern film capable of conveniently manufacturing a pattern film having a special structure, as well as, a pattern film having a special structure.SOLUTION: A formation method of pattern films includes to form, on the substrate, a film 2a made of an emulsion comprising dispersed particles 21a containing a first liquid cured by irradiation of an active energy beam and a dispersion medium 22 comprising a second liquid that is not cured by irradiation of the active energy beam, to cure by irradiating the active energy beam in pattern on a film to cure the first liquid present in a region irradiated by the active energy beam, to remove, after irradiation of the active energy beam, at least a part of the second liquid from the film, and to cure the uncured first liquid contained in the above-described film from which at least a part of the second liquid was removed, in which the irradiation of the active energy beam is performed with an integrated light amount exceeding the integrated light amount by which a difference of elevation of the pattern in the irradiated region and the non-irradiated region of the active energy beam becomes maximum.SELECTED DRAWING: Figure 4
Inventors:
INABA YOSHIMI
Application Number:
JP2020054432A
Publication Date:
October 07, 2021
Filing Date:
March 25, 2020
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G03F7/20; B05D3/00; B05D3/06; B05D7/24
Attorney, Agent or Firm:
Kurata Masatoshi
Nobuhisa Nogawa
Tadashi Inoue
Naoki Kono
Shigeru Iino
Sanae Kaneko
Nobuhisa Nogawa
Tadashi Inoue
Naoki Kono
Shigeru Iino
Sanae Kaneko