Title:
RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2022185563
Kind Code:
A
Abstract:
To provide a radiation sensitive resin composition, and a resist pattern formation method, capable of forming a resist pattern excellent in sensitivity to exposure light, and further excellent in LWR performance and CDU performance.SOLUTION: A radiation sensitive resin composition includes a polymer having a first structural unit shown by formula (1), in which solubility into a developer is changed by action of acid, and a radiation-sensitive acid generator.SELECTED DRAWING: None
Inventors:
KIRIYAMA KAZUYA
TANIGUCHI TAKUHIRO
NISHIGORI KATSUTOSHI
KINOSHITA NATSUKO
TANIGUCHI TAKUHIRO
NISHIGORI KATSUTOSHI
KINOSHITA NATSUKO
Application Number:
JP2022065851A
Publication Date:
December 14, 2022
Filing Date:
April 12, 2022
Export Citation:
Assignee:
JSR CORP
International Classes:
G03F7/039; C08F212/14; C08F220/18; G03F7/20
Attorney, Agent or Firm:
Yoshinori Ikeda
Amano Kazunori
Katsumasa Fujimoto
Koji Ishida
Masako Matsuura
Amano Kazunori
Katsumasa Fujimoto
Koji Ishida
Masako Matsuura