Title:
SUBSTRATE CLEANING DEVICE
Document Type and Number:
Japanese Patent JP2022189495
Kind Code:
A
Abstract:
To provide a substrate cleaning device which is prevented from increasing in size and furthermore can efficiently clean a substrate.SOLUTION: A substrate cleaning device includes: a substrate holding portion; a first cleaning implement; a second cleaning implement; and a third cleaning implement. The substrate holding portion holds a circular substrate W in a horizontal posture. The first cleaning implement is scanned above the substrate in such a way as to pass through a point P1 of an outer edge of the substrate W in a plan view, thus the first cleaning implement W cleans an upper surface of the substrate W. The second cleaning implement comes in contact with a point P2 of an external edge of the substrate W in the plan view, and thus the second cleaning implement cleans an external peripheral end portion of the substrate W. A virtual line L1 passing through the point P1 and the point P2 and a virtual line L2 parallel to the line L1 as well as passing through a center P0 of the substrate W are defined. The third cleaning implement is arranged in a region below the substrate W and opposite to the first and second cleaning implements with the line L2 between the third cleaning implement and the first and second cleaning implements, and cleans a lower surface of the substrate W.SELECTED DRAWING: Figure 4
Inventors:
SHINOHARA TOMOYUKI
OKADA YOSHIFUMI
OKITA NOBUAKI
SHINOHARA TAKASHI
ISHII JUNICHI
NAKAMURA KAZUKI
TAKAHASHI TAKUMA
OKADA YOSHIFUMI
OKITA NOBUAKI
SHINOHARA TAKASHI
ISHII JUNICHI
NAKAMURA KAZUKI
TAKAHASHI TAKUMA
Application Number:
JP2021098099A
Publication Date:
December 22, 2022
Filing Date:
June 11, 2021
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/304
Attorney, Agent or Firm:
Masahiro Nakagawa
Go Sakane
Hideyuki Sawamura
Go Sakane
Hideyuki Sawamura