Title:
【発明の名称】電子ビ―ム・リソグラフィにおける設計パタ―ン分割方法および装置
Document Type and Number:
Japanese Patent JP2501265
Kind Code:
B2
Abstract:
A method of partitioning design shapes, in an E-beam lithography system, into subshapes such that a constant dose may be applied to an E-beam sensitive resist within each subshape. Within each subshape the constant dose corresponds to an approximation to an indicator function, indicative of the degree of the proximity effect, such as the effective exposure of the resist from backscattered electrons or the required dose. The error of the approximation is equal to a predetermined value for each subshape, and can depend upon the position of the subshape within the shape and the influence of errors in the applied dose at that position on the position, on development, of the edge of the shape.
Inventors:
ABURAHAMU ZUI MEIRI
DO RAMU
UJI SHUBADORON
DO RAMU
UJI SHUBADORON
Application Number:
JP1837892A
Publication Date:
May 29, 1996
Filing Date:
January 08, 1992
Export Citation:
Assignee:
INTAANASHONARU BIJINESU MASHIINZU CORP
International Classes:
H01J37/302; H01L21/027; H01J37/317; H01L21/30; (IPC1-7): H01L21/027
Attorney, Agent or Firm:
Kiyoshi Goda (2 outside)