Title:
【発明の名称】表面処理方法および装置
Document Type and Number:
Japanese Patent JP2515775
Kind Code:
B2
Abstract:
A surface treatment apparatus for treating the surface of a substrate that is supported on a rotating table. The apparatus has a plate transmissive of ultraviolet rays that is mounted in parallel with the substrate. The plate has a plurality of supply nozzles for supplying a reactive gas to the rotating substrate surface, the nozzles being provided at positions of different radius of rotation in order to complete the surface treatment in a short period of time.
Inventors:
KAWASUMI KENICHI
INADA AKIISA
INADA AKIISA
Application Number:
JP3325187A
Publication Date:
July 10, 1996
Filing Date:
February 18, 1987
Export Citation:
Assignee:
HITACHI LTD
International Classes:
B01J19/12; B01J15/00; (IPC1-7): B01J19/12
Domestic Patent References:
| JP50105548A | ||||
| JP60212222A |
Attorney, Agent or Firm:
Toshiyuki Usuda