Title:
【発明の名称】二次イオン質量分析装置における定量分析法
Document Type and Number:
Japanese Patent JP2517749
Kind Code:
B2
Abstract:
PURPOSE:To allow quantitative analysis by a thermodynamic analysis method even if there is no internal standard element in a sample by using the constituting element of the primary ion beam implanted to the sample as the internal standard element. CONSTITUTION:A liquid metal ion source 1 packed with an AuSi alloy 1 as a primary ion material is heated by electron bombardment and the sample is irradiated with the primary ion beam 3 drawn out thereof to generate secondary ions 5. The intensity per element of the secondary ions 5 is detected by a detector 7 via the mass spectrometer 6. The plasma temp. and electron density of the irradiated part are determined by calculation. The data groups are obtd. by changing the sample and making the similar measurement. The analysis of an unknown sample is executed by first drawing the mass spectra of the secondary ions, making the compsn. analysis and selecting out the approximate data from the data group from the kinds of the deduced sample, the primary ion species and the secondary ion intensity of the primary ion constituting elements, then calculating the concn. of the analysis element.
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Inventors:
IWAMOTO HIROSHI
TAMURA HIFUMI
TAMURA HIFUMI
Application Number:
JP18976388A
Publication Date:
July 24, 1996
Filing Date:
July 29, 1988
Export Citation:
Assignee:
HITACHI SEISAKUSHO KK
HITACHI KEISOKU ENJINIARINGU KK
HITACHI KEISOKU ENJINIARINGU KK
International Classes:
G01N23/225; H01J37/08; H01J49/16; H01J49/26; (IPC1-7): G01N23/225
Domestic Patent References:
| JPS585377A |
Attorney, Agent or Firm:
Tatsuyuki Unuma (1 outside)