Title:
【発明の名称】半導体薄膜の製造装置
Document Type and Number:
Japanese Patent JP2842551
Kind Code:
B2
Abstract:
PURPOSE: To prevent the occurrence of defects in a semiconductor thin film by avoiding the bringing of impurities in the thin film through a tray. CONSTITUTION: In a semiconductor thin film manufacturing device which is constituted so that semiconductor thin films can be formed in reaction chambers 2, 3, and 4 while a tray 7 carrying the substrates 6 is successively carried to a taking-out chamber 5 from a preparation chamber 1 through the reaction chambers 2, 3, and 4, a tray carrying chamber 9 is provided to carry the tray 7 discharged from the chamber 5 to the preparation chamber 1 in a state where the tray 1 is shielded from the atmosphere.
Inventors:
HASHIMOTO HARUHISA
SAKAI SOICHI
NISHIWAKI HIDENORI
SAKAI SOICHI
NISHIWAKI HIDENORI
Application Number:
JP4111895A
Publication Date:
January 06, 1999
Filing Date:
February 28, 1995
Export Citation:
Assignee:
SANYO DENKI KK
International Classes:
F24F7/06; C23C16/44; C30B25/12; H01L21/205; H01L21/677; H01L21/68; H01L31/04; (IPC1-7): H01L21/205; C23C16/44; C30B25/12; F24F7/06; H01L21/68; H01L31/04
Domestic Patent References:
| JP3166373A | ||||
| JP4365349A | ||||
| JP6338465A | ||||
| JP6188300A |
Attorney, Agent or Firm:
Torii Hiroshi