Title:
【発明の名称】イオン注入装置のための補整されたスキャン波形発生器
Document Type and Number:
Japanese Patent JP2875282
Kind Code:
B2
Abstract:
A scan controller (80) for an ion implantation system includes a compensation circuit for generating a scanning signal from a triangle voltage signal. The scanning signal causes an ion beam (18) to be deflected so that, in the variety of geometries describing the orientation of the target (36) in the implantation system, the position of the intersection of the ion beam (18) with the planar target (36) surface changes linearly with time. In one embodiment the scanning signal has the form v(t) = -d -e/(t+c). In other embodiments the compensation circuit approximates the above function by means of polynomials.
Inventors:
PIITAA AREN FUITSUSHAA
Application Number:
JP13940489A
Publication Date:
March 31, 1999
Filing Date:
June 02, 1989
Export Citation:
Assignee:
BARIAN ASOSHEITSU INC
International Classes:
H01J37/248; H01J37/147; H01J37/317; (IPC1-7): H01J37/317; H01J37/147
Domestic Patent References:
| JP62259338A | ||||
| JP61501353A |
Attorney, Agent or Firm:
Sumio Takeuchi (1 outside)