Title:
【発明の名称】薄膜形成方法
Document Type and Number:
Japanese Patent JP2876318
Kind Code:
B2
Abstract:
PURPOSE:To prevent charged particles from colliding with a substrate by a method wherein the charged particles of plasma are confined by a magnetic mirror type magnetic field formed in a plasma chamber and raw gas is decomposed by the luminous energy of plasma and the energy of a neutral radical. CONSTITUTION:When microwaves are irradiated by a magnetron 5 through a waveguide tube 6, gas for plasma use is brought in a plasma state in a plasma chamber 2 and charged particles of plasma are confined by a magnetic mirror type magnetic field M. Moreover, a white light emission including a resonance line is generated in the chamber 2, raw gas is decomposed by the luminous energy of plasma and the energy of a neutral radical, which is not confined in the magnetic field M, in a reaction chamber 8 and an amorphous thin film is formed on a substrate 11. Thereby, the charged particles are prevented from colliding with the substrate, damage to the substrate and a growth film can be stopped end a device having superior characteristics can be manufactured.
Inventors:
OKAMOTO SHINGO
TARUI HISAKI
NAKAMURA NOBORU
TSUDA SHINYA
NAKANO SHOICHI
TARUI HISAKI
NAKAMURA NOBORU
TSUDA SHINYA
NAKANO SHOICHI
Application Number:
JP1283289A
Publication Date:
March 31, 1999
Filing Date:
January 20, 1989
Export Citation:
Assignee:
SANYO DENKI KK
International Classes:
H01L21/205; H01L21/263; H01L31/04; (IPC1-7): H01L21/205
Domestic Patent References:
| JP63142636A | ||||
| JP62222075A | ||||
| JP227718A |
Attorney, Agent or Firm:
Ryutaro Fujita