Title:
【発明の名称】電気光学装置の製造方法
Document Type and Number:
Japanese Patent JP2884359
Kind Code:
B2
Abstract:
PURPOSE:To uniformize picture display by controlling the amount of reactive gas corresponding to a resistance value from the terminal part of a wiring electrode, executing reactive sputtering and accumulating a base material. CONSTITUTION:A transparent substrate 21 is made of normal glass such as soda glass, etc., and a transparent picture element electrode 22 is deposited on the whole surface of the transparent substrate 21. A wiring electrode 24 is composed of an amorphas material with silicone as a main component and using the target of silicon monocrystal or silicon multicrystal and algon gas including nitrogen gas, a silicon nitriding film almost not including hydrogen is deposited according to a reactive sputtering method by a longitudinal passage type magnetron sputtering device. In such a case, with the silicon as the target, the amount of the reactive gas is controlled corresponding to the resistance value from the terminal part of the wiring electrode 24, the reactive sputtering is executed and a base a-Si material is deposited. Thus, the picture display is made uniform.
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Inventors:
KURODA YOSHIKI
Application Number:
JP524890A
Publication Date:
April 19, 1999
Filing Date:
January 12, 1990
Export Citation:
Assignee:
SEIKOO INSUTSURUMENTSU KK
International Classes:
G02F1/136; G02F1/1365; H01L49/02; (IPC1-7): G02F1/136; H01L49/02
Domestic Patent References:
| JP2193123A | ||||
| JP325984A | ||||
| JP336769A | ||||
| JP3166522A |
Attorney, Agent or Firm:
Keinosuke Hayashi