Title:
【発明の名称】SiO▲下2▼:K▲下2▼Oの高モル比を有する珪酸カリウム溶液の水熱製造方法
Document Type and Number:
Japanese Patent JP2922290
Kind Code:
B2
Abstract:
The direct hydrothermal production of high purity potassium silicate solutions having a high SiO2: K2O molar ratio by reaction of a silicon dioxide source with aqueous potassium hydroxide solutions is made possible by using a silicon dioxide source that contains a sufficient fraction of cristobalite phase, or by conditioning other crystalline forms of silicon dioxide by heating at or above 1100 DEG C., but below the melting point of silica, before the hydrothermal treatment. Preferably the potassium hydroxide solution has a concentration range of 10 to 40% by weight, and the reaction is carried out in a closed pressure reactor at temperatures of 150 DEG to 300 DEG C. and under saturated steam pressures corresponding to those temperatures.
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Inventors:
NOOTONII RUDORUFU
HOFU ARUFUREETO
SHURUTSU YOSUTO
HOFU ARUFUREETO
SHURUTSU YOSUTO
Application Number:
JP50201790A
Publication Date:
July 19, 1999
Filing Date:
January 22, 1990
Export Citation:
Assignee:
HENKERU KG AUFU AKUCHEN
International Classes:
C01B33/32; (IPC1-7): C01B33/32
Domestic Patent References:
| JP5348874A | ||||
| JP60186412A |
Attorney, Agent or Firm:
Aoyama Ryo (1 person outside)