Title:
【発明の名称】酸化物超伝導薄膜の表面処理方法および表面処理装置
Document Type and Number:
Japanese Patent JP2958054
Kind Code:
B2
Abstract:
PURPOSE:To remove the deteriorated layer on the surface of an oxide superconducting thin film without damaging the surface by irradiating a substrate covered with the oxide superconducting thin film with an ion beam in a vacuum. CONSTITUTION:A substrate 2 covered with an oxide superconducting thin film 9 is held by a holding and cooling mechanism 1 set in a vacuum vessel 8, and the vessel 8 is evacuated to <=10<-4>Torr through an evacuating system 7. The surface of the thin film 9 is irradiated with the inert gas ion beam having 10-200eV energy and ion beam with a halogen element as the constituent element respectively from ion sources 3 and 4 to remove the deteriorated layer on the surface, a metal layer is then continuously deposited from a metal depositing mechanism 5, and then an insulating layer is formed by an insulating layer depositing mechanism 6.
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Inventors:
ASANO HIDEFUMI
MICHIGAMI OSAMU
MORIWAKI KAZUYUKI
MICHIGAMI OSAMU
MORIWAKI KAZUYUKI
Application Number:
JP15188690A
Publication Date:
October 06, 1999
Filing Date:
June 11, 1990
Export Citation:
Assignee:
NIPPON DENSHIN DENWA KK
International Classes:
C04B41/90; C01G1/00; C01G3/00; C01G29/00; H01B12/06; H01B13/00; H01L39/24; (IPC1-7): C01G3/00; C01G1/00; C01G29/00; H01L39/24
Domestic Patent References:
| JP1252504A | ||||
| JP2162780A | ||||
| JP6450581A | ||||
| JP1236663A | ||||
| JP1157579A | ||||
| JP6487516A |
Attorney, Agent or Firm:
Fukumori Hisao