Title:
【発明の名称】高分解能光学顕微鏡および照射スポット光作成用マスク
Document Type and Number:
Japanese Patent JP2968080
Kind Code:
B2
Abstract:
A high resolution optical microscope consists of an irradiation spot beam-forming mask which is disposed in a dark or a bright field, whereby a diameter of each of a plurality of irradiation spot beams onto an object to be measured is made smaller than a size of the object, beyond Rayleigh's resolution limit. In the irradiation spot beam-forming mask, a phase array is regularly disposed in a two-dimensional direction so that neighboring portions of each of the irradiation spot beams are optically phase-shifted from one another at 180 degrees. Thus, a wide observation surface and a prompt measurement can be performed with a high resolution of 0.1 (my)m or less, far beyond Rayleigh's resolution limit.
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Inventors:
SHIMIZU ISAO
AOTANI SEIJI
AOTANI SEIJI
Application Number:
JP9889791A
Publication Date:
October 25, 1999
Filing Date:
April 30, 1991
Export Citation:
Assignee:
JEI ESU AARU KK
SHIMIZU ISAO
SHIMIZU ISAO
International Classes:
G02B21/00; G02B21/12; G02B27/58; (IPC1-7): G02B27/58
Domestic Patent References:
| JP4156507A | ||||
| JP4505971A |
Attorney, Agent or Firm:
Yoshikazu Tani (1 person outside)