Title:
【発明の名称】基板処理装置
Document Type and Number:
Japanese Patent JP2987148
Kind Code:
B1
Abstract:
A substrate processing apparatus includes a rotation accommodating shelf and a transfer machine. The rotation accommodating shelf is capable of accommodating a plurality of accommodating containers in which substrates are to be loaded. The transfer machine is for transferring the plurality of accommodating containers to the rotation accommodating shelf. The plurality of accommodating containers are respectively disposed on radial lines, which radiate from a rotation center of the rotation accommodating shelf, such that each accommodating container is respectively inclined in a horizontal plane in a same fixed direction with respect to a radial line.
Inventors:
HAYASHI AKINARI
Application Number:
JP1726799A
Publication Date:
December 06, 1999
Filing Date:
January 26, 1999
Export Citation:
Assignee:
KOKUSAI DENKI KK
International Classes:
H01L21/68; H01L21/677; (IPC1-7): H01L21/68; B65G1/00
Domestic Patent References:
| JP10256339A | ||||
| JP440534U |
Attorney, Agent or Firm:
Miyoshi Shoji