Title:
【発明の名称】2,4―ジニトロ―1―ナフトールを含有するポジ型フォトレジスト組成物
Document Type and Number:
Japanese Patent JP3135585
Kind Code:
B2
Abstract:
A light-sensitive positive photoresist composition containing a film forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a 2,4-dinitro-1-naphthol dye, where the dye is present at a level greater than 0.5 weight percent of the total photoresist composition. The dye reduces the linewidth variation of the resist pattern on a reflective substrate without significantly reducing the lithographic performance of the light-sensitive composition.
Inventors:
Lou Pin-Han
Kokinda Elaine Theey
Dixit Sanit S
Damel Ralph Earl
Kokinda Elaine Theey
Dixit Sanit S
Damel Ralph Earl
Application Number:
JP50811498A
Publication Date:
February 19, 2001
Filing Date:
August 06, 1997
Export Citation:
Assignee:
Clariant International Limited
International Classes:
G03F7/004; G03F7/022; G03F7/023; G03F7/09; G03F7/32; G03F7/38; G03F7/40; H01L21/027; (IPC1-7): G03F7/004; G03F7/022; H01L21/027
Domestic Patent References:
| JP7152151A | ||||
| JP5346664A |
Other References:
【文献】米国特許5478692(US,A)
【文献】米国特許5225312(US,A)
【文献】米国特許5225312(US,A)
Attorney, Agent or Firm:
Mitsufumi Ezaki (3 others)