Title:
【発明の名称】ヨウ化物を用いたCVDによるニッケルまたはニッケル合金の付着
Document Type and Number:
Japanese Patent JP3320336
Kind Code:
B2
Abstract:
The present invention discloses a CVD (Chemical Vapor Deposition) process where nickel or alloys thereof, such as, Ni/Cu, Ni/Co, are deposited on metal surfaces (32, 34) which are capable of receiving nickel or alloys thereof, using an Iodide source (23), preferably an Iodide salt, such as, Copper Iodide.
Inventors:
Srinivasa S.N.Lady
John Alrich Knickerbocker
Donald Lineay Wall
John Alrich Knickerbocker
Donald Lineay Wall
Application Number:
JP16163997A
Publication Date:
September 03, 2002
Filing Date:
June 18, 1997
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
C23C16/08; C23C16/44; H01L21/28; H01L21/285; H05K3/24; (IPC1-7): C23C16/08; H01L21/285
Domestic Patent References:
| JP1264990A |
Other References:
【文献】米国特許4664942(US,A)
【文献】米国特許5471033(US,A)
【文献】米国特許5471033(US,A)
Attorney, Agent or Firm:
Hiroshi Sakaguchi (1 person outside)