Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
【発明の名称】マスクパターンの欠陥修正方法
Document Type and Number:
Japanese Patent JP3377119
Kind Code:
B2
More Like This:
JP2021514309How to align a multi-beam irradiation system
WO/2002/036331DEVICE FOR SINTERING, REMOVING MATERIAL AND/OR LABELING BY MEANS OF ELECTROMAGNETICALLY BUNDLED RADIATION AND METHOD FOR OPERATING THE DEVICE
JP2004186635CUTTING DEVICE FOR SEMICONDUCTOR SUBSTRATE AND CUTTING METHOD
Inventors:
Hiroshi Kinoshita
Application Number:
JP33125193A
Publication Date:
February 17, 2003
Filing Date:
December 27, 1993
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HOYA Corporation
International Classes:
B23K26/00; C23F4/00; G03F1/72; G03F1/74; G03F7/20; H01L21/027; H05K3/00; (IPC1-7): G03F1/08; B23K26/00; C23F4/00; H01L21/027; H05K3/00
Domestic Patent References:
JP6074622A
JP5313354A
JP728228A
Attorney, Agent or Firm:
Shizuo Nakamura (1 outside)



 
Previous Patent: トレイ洗浄機

Next Patent: 汚染土壌の修復方法