Title:
リトグラフ投影装置、装置の製造方法および光学要素を製造する方法
Document Type and Number:
Japanese Patent JP3588095
Kind Code:
B2
Abstract:
A method of manufacturing a component that will, in use, experience a thermal load and will be operated at a mean temperature, includes selecting a material having a coefficient of thermal expansion having a zero-crossing at a first temperature and manufacturing the component using the selected material at a second temperature. The first temperature is between the second temperature and the mean operating temperature. Deformation of the component at the mean operating temperature are thus minimized. A lithographic apparatus includes a radiation system configured to provide a beam of radiation and a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. At least one component of the apparatus that in use experiences a thermal load is made of the selected material. A device manufacturing method includes providing a beam of radiation using a radiation system, patterning the beam, and projecting the patterned beam onto a target portion of the layer of radiation-sensitive material using a projection system. At least one component of the radiation system and/or projection system that experiences a thermal load in use is made of the selected material.
Inventors:
Wilhelms Josephs Box
Application Number:
JP2002382893A
Publication Date:
November 10, 2004
Filing Date:
December 02, 2002
Export Citation:
Assignee:
AJMEL Netherlands Lands Beth Rotten Fuennaught Shap
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP62131518A | ||||
| JP8068898A | ||||
| JP2001302340A |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Takakazu Yamamoto
Yukio Iwamoto
Hajime Asamura
Takakazu Yamamoto
Yukio Iwamoto