Title:
基板載置台の製造方法
Document Type and Number:
Japanese Patent JP3626933
Kind Code:
B2
Abstract:
A plasma processing system has a susceptor, provided in a processing vessel, for supporting thereon a substrate. A process gas is supplied into the processing vessel to produce the plasma of the process gas. The susceptor has a dielectric film formed on a base, and a plurality of protrusions formed on the film. The protrusions of the susceptor are formed by thermal-spraying a ceramic onto the dielectric film via an aperture plate having a plurality of circular apertures.
Inventors:
Joichi Ushioda
Koichi Sato
Tsutomu Satoyoshi
Hiromichi Ito
Koichi Sato
Tsutomu Satoyoshi
Hiromichi Ito
Application Number:
JP2001393918A
Publication Date:
March 09, 2005
Filing Date:
December 26, 2001
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
C23C16/458; G02F1/13; H01L21/3065; H01L21/683; (IPC1-7): H01L21/68; H01L21/3065
Domestic Patent References:
| JP9327188A | ||||
| JP10098092A | ||||
| JP8148955A | ||||
| JP2000021962A | ||||
| JP10150100A | ||||
| JP10256360A | ||||
| JP8070034A | ||||
| JP7045693A | ||||
| JP63095644A |
Foreign References:
| WO1999016122A1 |
Attorney, Agent or Firm:
Hiroshi Takayama