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Title:
高度な耐摩耗性コーティングの蒸着のためのイオンビーム法
Document Type and Number:
Japanese Patent JP3837159
Kind Code:
B2
Abstract:
An ion beam deposition method is provided for manufacturing a coated substrate with improved abrasion resistance, and improved lifetime. According to the method, the substrate is first chemically cleaned to remove contaminants. In the second step, the substrate is inserted into a vacuum chamber, and the air in said chamber is evacuated. In the third step, the substrate surface is bombarded with energetic ions to assist in the removal of residual hydrocarbons and surface oxides, and to activate the surface. Alter After the substrate surface has been sputter-etched, a protective, abrasion-resistant coating is deposited by ion beam deposition. The ion beam-deposited coating may contain one or more layers. Once the chosen thickness of the coating has been achieved, the deposition process on the substrates is terminated, the vacuum chamber pressure is increased to atmospheric pressure, and the coated substrate products having improved abrasion-resistance are removed from the vacuum chamber. The coated products of this invention have utility as plastic sunglass lenses, ophthalmic lenses, bar codes scanner windows, and industrial wear parts that must be protected from scratches and abrasion.

Inventors:
Nap Bradley Jay
Chimock Fred M
Pete Rickle Rudolph Hugo
Galvin Norman Donald
Application Number:
JP52307695A
Publication Date:
October 25, 2006
Filing Date:
March 01, 1995
Export Citation:
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Assignee:
Morgan Chemical Products Inc.
International Classes:
B05D3/04; B32B9/00; B32B7/02; C23C14/32; C23C16/02; C23C16/30; C23C16/32; C23C16/34; C23C16/513; C23F4/00
Domestic Patent References:
JP6501745A
JP2070063A
JP6008510B2
JP5304104A
JP5078508A
Foreign References:
WO1994003331A1
Attorney, Agent or Firm:
Minoru Nakamura
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Hideto Takeuchi
Toshio Imajo
Nobuo Ogawa
Village shrine Atsuo
Takaki Nishijima
Atsushi Hakoda