Title:
仕上げを向上したスパッターターゲットを製造する方法
Document Type and Number:
Japanese Patent JP3881517
Kind Code:
B2
Abstract:
A method is provided for achieving an enhanced finish on a sputter target surface that results in good film uniformity, low particle counts, and little to no burn-in time. The method involves chemically etching the surface of the sputter target by immersing the surface one or more times in an etching solution, with intermediate rinsing steps. The result is a surface substantially free of mechanical deformation that exhibits a surface similar to a sputtered target with a surface roughness of 10-30 µin.
Inventors:
James Elliot Joyce
Thomas John Hunt
Paul Sanford Gilman
Thomas John Hunt
Paul Sanford Gilman
Application Number:
JP2000568696A
Publication Date:
February 14, 2007
Filing Date:
September 02, 1999
Export Citation:
Assignee:
Praxair ST Technology Incorporated
International Classes:
B44C1/22; C23F3/00
Domestic Patent References:
| JP6158300A |
Foreign References:
| WO1998029213A1 |
Attorney, Agent or Firm:
Motohiro Kurauchi
Hiroshi Kazama
Hiroshi Kazama