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Title:
薄膜磁気ディスクおよびシリコンウェハ上の薄膜層の厚み、反射率、粗度、表面輪郭および磁気パターンを同時に測定するシステムおよび方法
Document Type and Number:
Japanese Patent JP3895596
Kind Code:
B2
Abstract:
A system and method for performing a magnetic imaging, optical profiling, and measuring lubricant thickness and degradation, carbon wear, carbon thickness, and surface roughness of thin film magnetic disks and silicon wafers at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat is provided. The system and method involve a focused optical light whose polarization can be switched between P or S polarization is incident at an angle to the surface of the thin film magnetic disk. This generates both reflected and scattered light that may be measured to determine various values and properties related to the surface of the disk, including identifying the Kerr-effect in reflected light for determination of point magnetic properties. In addition, the present invention can mark the position of an identified defect.

Inventors:
Meeks, Stephen W.
Casdiner, rasmin
Application Number:
JP2001528415A
Publication Date:
March 22, 2007
Filing Date:
October 06, 2000
Export Citation:
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Assignee:
Candela Instruments
International Classes:
G11B5/84; G01B11/06; G01B11/30; G01N21/21; G01N21/47; G01N21/95
Domestic Patent References:
JP11173994A
JP10227764A
JP4162215A
JP3221804A
Attorney, Agent or Firm:
Takashi Ishida
Jun Tsuruta
Masaya Nishiyama
Higuchi Souji