Title:
改善されたガラス質シリカの製造方法
Document Type and Number:
Japanese Patent JP3920321
Kind Code:
B2
Abstract:
PCT No. PCT/GB94/01304 Sec. 371 Date Dec. 5, 1995 Sec. 102(e) Date Dec. 5, 1995 PCT Filed Jun. 16, 1994 PCT Pub. No. WO95/00450 PCT Pub. Date Jan. 5, 1995A linear burner for the synthesis of silica by vapor-phase reaction of a silicon-containing feedstock in a flame comprises at least five slots opening to an exit face (52a) of the burner and extending side-by-side in the elongate direction of the linear burner, and includes means (P1-P10) to supply a separate gas flow to each of said slots. An assembly of separator plates (52) is disposed between opposed casing parts (50, 51), which assembly defines the slots. At least one of the casing parts (50, 51) defines at least part of a respective plenum chamber (54) for each gas flow, each plenum chamber (54) communicating with a different one of said slots in the separator assembly. The invention also extends to a method of operating such a linear burner.
Inventors:
Ian George, Seis
Robert Nicholson
Turnbull, Paul William
Wells, Peter John
Robert Nicholson
Turnbull, Paul William
Wells, Peter John
Application Number:
JP50254895A
Publication Date:
May 30, 2007
Filing Date:
June 16, 1994
Export Citation:
Assignee:
Saint-Gobain Quartz Public Limited Company
International Classes:
C03B8/04; C03B19/14; F23D14/08; C03B20/00; C03B37/014; F23D14/56; F23D14/58
Domestic Patent References:
| JP4275924A | ||||
| JP5959626U |
Foreign References:
| US4682994 |
Attorney, Agent or Firm:
Takashi Ishida
Taijiro Ogawa
Masaya Nishiyama
Taijiro Ogawa
Masaya Nishiyama