Title:
レチクルバリヤシステム
Document Type and Number:
Japanese Patent JP3975212
Kind Code:
B2
Abstract:
The present invention is directed to a reticle barrier system that prevents contaminants from landing on a mask within lithographic systems using extreme ultra violet light. In particular, a reticle barrier system is provided that consists of a mask barrier and a set of contact barriers. The mask barrier surrounds a mask formed on a reticle, while the contact barriers are affixed between the mask and contact spots on a reticle. The barriers have a height relative to the mask, and different geometries are provided. Collectively, the mask and contact barriers reduce the number of contaminants landing on a mask surface without the use of a pellicle. In an alternate embodiment, the reticle barrier system includes only a mask barrier. Similarly, in another alternate embodiment, the reticle barrier system includes only contact barriers.
Inventors:
Stephen Lou
Richard Lenox
Richard Lenox
Application Number:
JP2004222357A
Publication Date:
September 12, 2007
Filing Date:
July 29, 2004
Export Citation:
Assignee:
AS ML Holding N.V.
International Classes:
G03F1/14; A47G1/12; B44F1/00; G03F9/00; H01L21/027
Domestic Patent References:
| JP7084357A | ||||
| JP5281712A | ||||
| JP7039047U |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki