Title:
研摩材
Document Type and Number:
Japanese Patent JP3986960
Kind Code:
B2
Abstract:
A polishing material is provided in which the dispersibility of the abrasive grains of the polishing material having, as a major component, rare earth oxides including cerium oxide is made better and the hardness of abrasive grain precipitates is reduced, and at the same time high efficiency of polishing can be achieved stably. According to the present invention, in a polishing material having, as the major component, rare earth oxides including cerium oxide, any one of crystalline cellulose, calcium secondary phosphate, a condensate of sodium beta -naphthalenesulphonate and formalin, and synthetic silica is contained as an anti-solidification agent capable of softening abrasive grain precipitates of the polishing material when the abrasive grains of the polishing material are dispersed into a dispersion medium, and sodium hexametaphosphate or pyrophosphate is contained as a dispersant capable of dispersing the abrasive grains of the polishing material into the dispersion medium.
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| JP5283247 | Abrasive liquid composition for glass substrate |
| WO/2023/032714 | POLISHING COMPOSITION |
Inventors:
Utsuno Yoshitsugu
山▲崎▼ 秀彦
Shigeru Kuwahara
山▲崎▼ 秀彦
Shigeru Kuwahara
Application Number:
JP2002534451A
Publication Date:
October 03, 2007
Filing Date:
October 02, 2001
Export Citation:
Assignee:
Mitsui Mining & Smelting Co., Ltd.
International Classes:
C09K3/14; B24B37/00; B24D3/34; C03C19/00; C09K23/14; C09K23/52; C09K23/56; H01L21/304
Domestic Patent References:
| JP56029717B1 | ||||
| JP2001192645A | ||||
| JP2000109816A | ||||
| JP2014280A |
Attorney, Agent or Firm:
Daisuke Tanaka