Title:
デバイス製造方法、コンピュータ・プログラム、及びリソグラフィ投影装置
Document Type and Number:
Japanese Patent JP4004461
Kind Code:
B2
Abstract:
A device manufacturing method includes using a patterning device to impart a beam of radiation with a pattern in its cross-section, projecting the patterned beam of radiation onto a plurality of target portions of substantially the same area within a periphery of the substrate, and projecting a beam of radiation onto a substrate edge target portion overlapping an edge of the substrate. A cross-section of the beam projected on the substrate edge target portion has an area smaller than the area of the plurality of target portions of substantially the same area within the periphery of the substrate. A part of the cross-section of the beam is incident on the substrate, and another part of the cross-section of the beam is not incident on the substrate.
Inventors:
YOST Jeroen Ottens
Marcel Nicolas Jacobs van Kerfink
Marcel Nicolas Jacobs van Kerfink
Application Number:
JP2003420697A
Publication Date:
November 07, 2007
Filing Date:
December 18, 2003
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/22; H01L21/027; G03F7/20
Domestic Patent References:
| JP2000269122A | ||||
| JP9082633A |
Attorney, Agent or Firm:
Sakaki Morishita