Title:
ブラシ洗浄装置及びワーク洗浄システム
Document Type and Number:
Japanese Patent JP4007677
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a brush cleaning device and a work-cleaning system having this brush cleaning device by which brush cleaning time is reduced, the cleaning system can be downsized because a rotary mechanism for a wafer is not required, and the residue of contaminants is easily removed because a wafer can be held vertically. SOLUTION: A brush cleaning device comprises an upper brush cleaning means 12, an upper stopper means 14, a lower brush cleaning means 16 and a lower stopper means 18. The upper brush cleaning means 12 has a pair or pairs of upper rotary brushes 12a which are opposed to each other horizontally and cleans a discoid work which is transferred vertically between a pair or pairs of upper rotary brushes 12a. The upper stopper means 14 is provided below the brush cleaning means 12 and performs the stoppage and unloading of the work. The lower brush cleaning means 16 is provided below the upper stopper means 14, comprises a pair or pairs of lower rotary brushes 16a which are opposed to each other horizontally, and cleans the work which is transferred vertically between a pair or pairs of lower rotary brushes 16a. The lower stopper means 18 is provided vertically movably and stops, supports, and vertically moves the work.
Inventors:
Kenji Kobayashi
Toshikazu Saito
Toshikazu Saito
Application Number:
JP11236198A
Publication Date:
November 14, 2007
Filing Date:
April 22, 1998
Export Citation:
Assignee:
Shin-Etsu Semiconductor Co., Ltd.
Sanyasu Semiconductor Industry Co., Ltd.
Sanyasu Semiconductor Industry Co., Ltd.
International Classes:
B08B1/04; H01L21/304
Domestic Patent References:
| JP8017771A | ||||
| JP5047724A | ||||
| JP5134399A | ||||
| JP1140727A |
Attorney, Agent or Firm:
Shoji Ishihara