CVD成膜装置及びCVD成膜装置用内部電極の清掃方法

Title:

CVD成膜装置及びCVD成膜装置用内部電極の清掃方法

Document Type and Number:

Japanese Patent JP4031654

Kind Code:

B2

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Inventors:

Kenichi Hama
Go Kage
Takumi Kobayashi
Takeharu Kawabe

Application Number:

JP2002066818A

Publication Date:

January 09, 2008

Filing Date:

March 12, 2002

Export Citation:

Assignee:

Mitsubishi Corporation Plastic Co., Ltd.
U-Tech Co., Ltd.
Kirin Brewery Co., Ltd.

International Classes:

C23C16/44

Domestic Patent References:

Attorney, Agent or Firm:

Katsuhiro Imashita
Kenji Okada

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