Title:
被研磨膜の研磨方法
Document Type and Number:
Japanese Patent JP4095061
Kind Code:
B2
Abstract:
A method is provided that includes a main laminate making step of forming a plurality of main magnetic poles onto a substrate, covering each magnetic pole with a first protective film, and forming onto the first protective film a stopper film provided with openings at respective parts opposing the main magnetic poles. Each opening is wider than a planar width of a corresponding main magnetic pole, so as to make a main laminate. The method includes a main polishing step of polishing the first protective film and main magnetic poles through the openings of the stopper film in the main laminate by a CMP method. In the main laminate making step, the openings in the stopper film is provided with a width distribution.
Inventors:
Satoshi Ueshima
Application Number:
JP2004358787A
Publication Date:
June 04, 2008
Filing Date:
December 10, 2004
Export Citation:
Assignee:
tdk Corporation
International Classes:
G11B5/31; B24B37/00; G11B5/60
Domestic Patent References:
| JP2004281017A | ||||
| JP2004515918A | ||||
| JP2001358105A |
Foreign References:
| WO2000077777A1 | ||||
| WO2004010487A1 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Shiro Terasaki
Hiroaki Aoki
Takashi Mikami
Shiro Terasaki
Hiroaki Aoki
Takashi Mikami