Title:
研磨用組成物
Document Type and Number:
Japanese Patent JP4095798
Kind Code:
B2
Abstract:
A polishing composition to be used for polishing a magnetic disk substrate, which comprises one member selected from a phosphate and a phosphorus compound, or two members selected from phosphoric acid, a phosphate and a phosphorus compound; silica; and water; wherein when phosphonic acid is contained alone aluminium nitrate is not contained. Another polishing composition is shown that comprises at least one member from a phosphoric acid, a phosphate and a phosphorus compound; silica; water; and diammonium ethylenediamine tetraacetate. The phosphorus compound may be pyrophosphoric acid, phosphonic acid, phosphinic acid, hydroxyethylidene diphosphonic acid, nitrotri(methylene phosphonic acid) or phosphonobutane tricarboxylic acid, or a salt thereof.
Inventors:
Tomohide Kamiya
Junichi Hirano
Anfuku Noboru
Noritaka Yokomichi
Toshiki Ohwaki
Junichi Hirano
Anfuku Noboru
Noritaka Yokomichi
Toshiki Ohwaki
Application Number:
JP2001387175A
Publication Date:
June 04, 2008
Filing Date:
December 20, 2001
Export Citation:
Assignee:
Fujimi Incorporated Co., Ltd.
International Classes:
C09K3/14; B24B37/00; C09G1/02; C09G1/18; G11B5/84
Domestic Patent References:
| JP61291674A | ||||
| JP62236669A | ||||
| JP9204657A | ||||
| JP9208934A | ||||
| JP10172934A | ||||
| JP10172935A | ||||
| JP10172936A | ||||
| JP10172937A | ||||
| JP1180708A | ||||
| JP200073049A | ||||
| JP2001148117A | ||||
| JP2001155332A | ||||
| JP2001288455A | ||||
| JP2001294848A | ||||
| JP2001323254A | ||||
| JP2002327170A | ||||
| JP2003535968A |
Foreign References:
| WO2001079377A1 |
Attorney, Agent or Firm:
Hironobu Onda
Makoto Onda
Makoto Onda