Title:
ガス流により回転支持され回転駆動される基板保持器を備えたCVD反応炉
Document Type and Number:
Japanese Patent JP4099060
Kind Code:
B2
Abstract:
The invention relates to a device for depositing layers, particularly crystalline layers, onto substrates. Said device comprises a process chamber arranged in a reactor housing where the floor thereof, comprises at least one substrate holder which is rotatably driven by a gas flow flowing in a feed pipe associated with said floor. Said substrate holder is disposed in a bearing cavity on a gas cushion and held in place thereby. The aim of the invention is to technologically improve the design of a substrate holder which is rotatably mounted in a gas flow, particularly in a linear cross-flowing process chamber. Said bearing cavity is associated with a tray-shaped element arranged below the outflow of the feed pipe.
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Inventors:
Keppeler, Johannes
Wishmeyer, Frank
Berge, Rene
Wishmeyer, Frank
Berge, Rene
Application Number:
JP2002541149A
Publication Date:
June 11, 2008
Filing Date:
October 25, 2001
Export Citation:
Assignee:
Ixtron, Age
International Classes:
C23C16/458; C30B25/10; C30B25/12; C30B25/14; H01L21/205
Domestic Patent References:
| JP7066142A | ||||
| JP2022473A |
Foreign References:
| US5226383 | ||||
| US6039812 |
Attorney, Agent or Firm:
Takashiro Kojima
Noriko Kawai
Takuya Sato
Noriko Kawai
Takuya Sato