Title:
ナノインプリント方法
Document Type and Number:
Japanese Patent JP4111997
Kind Code:
B1
Abstract:
Provided is an imprint method that includes the steps of softening resist in an object to be processed, by using compressed gas or supercritical fluid, the object including a substrate and the resist applied onto the substrate, and transferring a predetermined pattern onto the resist by pressing a mold that forms the predetermined pattern against the resist in the object.
Inventors:
Atsushi Yusa
Toshiki Sugiyama
Toshiki Sugiyama
Application Number:
JP2008036560A
Publication Date:
July 02, 2008
Filing Date:
February 18, 2008
Export Citation:
Assignee:
Hitachi Maxell Co., Ltd.
International Classes:
H01L21/027; B29C59/02; C03C17/00
Domestic Patent References:
| JP2002270540A | ||||
| JP2002543582A | ||||
| JP2004504718A | ||||
| JP2002533898A |
Attorney, Agent or Firm:
Ryosuke Fujimoto