Title:
イオン注入システムにおける改良したイオン加速方法およびその装置
Document Type and Number:
Japanese Patent JP4131170
Kind Code:
B2
Abstract:
A method and apparatus are disclosed for accelerating ions in an ion implantation system. An ion accelerator is provided which comprises a plurality of energizable electrodes energized by a variable frequency power source, in order to accelerate ions from an ion source. The variable frequency power source allows the ion accelerator to be adapted to accelerate a wide range of ion species to desired energy levels for implantation onto a workpiece, while reducing the cost and size of an ion implantation accelerator.
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Inventors:
Sadatmand, Koroche
Diverglio, William Frank
Swenson, David Day.
Diverglio, William Frank
Swenson, David Day.
Application Number:
JP2002555445A
Publication Date:
August 13, 2008
Filing Date:
December 27, 2001
Export Citation:
Assignee:
Axcelis Technologies, Inc.
International Classes:
C23C14/48; H01J37/317; H01L21/265; H05H9/00
Domestic Patent References:
| JP61264650A | ||||
| JP9237700A | ||||
| JP51023674B1 |
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Kaoru Onozuka
Miyazaki Yoshio
Kaoru Onozuka