プラズマエッチング残留物を除去するための非腐食性洗浄組成物

Title:

プラズマエッチング残留物を除去するための非腐食性洗浄組成物

Document Type and Number:

Japanese Patent JP4147320

Kind Code:

B2

Abstract:

A non-corrosive cleaning composition for removing plasma etching residues having a pH from 2 to 6 and comprising: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.

More Like This:

JPH07179890	FINISHING LIQUID FOR WIPING OPTICAL PART
JP6552676	A removal liquid for removing ruthenium deposits on a substrate on which a ruthenium-containing film is formed.
WO/2001/004248	PROCESS FOR PRODUCING PARTICLES OF AMINE REACTION PRODUCT

Inventors:

Honda, kenji
Rothgery, Eugene F

Application Number:

JP51269898A

Publication Date:

September 10, 2008

Filing Date:

August 22, 1997

Export Citation:

Click for automatic bibliography generation Help

Assignee:

FujiFilm Electronic Materials USA, Inc.

International Classes:

C11D7/32; C11D7/60; C11D1/62; C11D3/02; C11D3/06; C11D3/20; C11D3/24; C11D3/26; C11D3/28; C11D3/30; C11D3/34; C11D3/60; C11D7/06; C11D7/10; C11D7/16; C11D7/26; C11D7/34; C11D11/00; C11D17/08; G03F7/42; H01L21/302; H01L21/304; H01L21/3065

Foreign References:

US4509989

Attorney, Agent or Firm:

Junji Yuda
Shoji Miwa
Chika Takagi

Previous Patent: 変異ペニシリンＧアシラーゼ遺伝子

Next Patent: 固体高分子型燃料電池用電極