Title:
走査電子顕微鏡
Document Type and Number:
Japanese Patent JP4164470
Kind Code:
B2
Abstract:
In a scanning electron microscope, scanning region is set to be narrow, upon which focused electron beam is scanned, so that the focused electron beam can be irradiated at the almost same position by plural numbers of times, irrespective of movement of the stage or of moving of the stage during braking thereof, and upon that region to be scanned is irradiated the focused electron beam, by plural numbers of times, while changing the focal position, thereby forming an image thereof. From the image formed is calculated out a section, from which a focus-in position can be calculated out, and then the focus-in position is calculated out from that calculated section.
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Inventors:
Honda Toshifumi
Fukunishi Munenori
Kenji Ohara
Fukunishi Munenori
Kenji Ohara
Application Number:
JP2004147336A
Publication Date:
October 15, 2008
Filing Date:
May 18, 2004
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/20; H01J37/21; G21K7/00
Domestic Patent References:
| JP8148109A | ||||
| JP6267481A | ||||
| JP10170817A | ||||
| JP8096738A | ||||
| JP11183154A | ||||
| JP2002244029A | ||||
| JP2002310962A | ||||
| JP2002334678A |
Attorney, Agent or Firm:
Polaire Patent Business Corporation
Katsuo Ogawa
Kyosuke Tanaka
Katsuo Ogawa
Kyosuke Tanaka