Title:
露光方法及び装置
Document Type and Number:
Japanese Patent JP4174324
Kind Code:
B2
Abstract:
An exposure method for exposing a pattern onto plural portions on an object includes the steps of obtaining first flatness information about the plural portions, specifying a portion among the plural portions, which has flatness information that meets a predetermined condition among the first flatness information, obtaining second flatness information that is more detailed than the first flatness information about the portion specified by the specifying step, and exposing, based on the second flatness information, the portion that has been specified.
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Inventors:
Hideki Ina
Application Number:
JP2003000112A
Publication Date:
October 29, 2008
Filing Date:
January 06, 2003
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; G03B27/52; H01L21/027; G03B27/68; G03F9/00; G03F9/02
Domestic Patent References:
| JP2001075294A | ||||
| JP2001250768A | ||||
| JP10092717A | ||||
| JP2000260840A | ||||
| JP5304078A |
Attorney, Agent or Firm:
Ryosuke Fujimoto