Title:
SOG膜の形成方法
Document Type and Number:
Japanese Patent JP4188606
Kind Code:
B2
Abstract:
Methods of forming a spin-on-glass (SOG) layer are disclosed. An SOG layer is formed on an integrated circuit substrate. A first curing process is performed on the SOG layer. Less than all of the SOG layer is removed from the integrated circuit substrate through a mask pattern on the SOG layer to provide a remaining portion of the SOG layer on the integrated circuit substrate. A second curing process is performed on the SOG layer. The remaining portion of the SOG layer is removed to expose the integrated circuit substrate.
Inventors:
Zhao Min Hei
Zhao
Shiki Hiroshi
Chung Hiroe
Zhao
Shiki Hiroshi
Chung Hiroe
Application Number:
JP2002034640A
Publication Date:
November 26, 2008
Filing Date:
February 12, 2002
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO.,LTD.
International Classes:
H01L21/768; H01L21/302; H01L21/308; H01L21/31; H01L21/311; H01L21/316
Domestic Patent References:
| JP3102853A | ||||
| JP2230735A | ||||
| JP6085079A |
Attorney, Agent or Firm:
Masatake Shiga
Takashi Watanabe
Takashi Watanabe