Title:
リトグラフ装置、デバイス製造方法およびデバイス
Document Type and Number:
Japanese Patent JP4194986
Kind Code:
B2
Abstract:
A lithographic apparatus comprising an illumination system for providing a projection beam of radiation including components having a first radiation component having a first wavelength and a second radiation component having a second wavelength for reproducing features patterned on a mask. The lithographic apparatus according to the invention comprises an illumination system having an adjustable filtering means for filtering said beam of radiation, arranged in use, to selectively adjust the proportion of said second radiation component in said beam. The apparatus of the invention provides improved reproduction of both isolated and dense features patterned on the mask.
Inventors:
Yog brue bach
Application Number:
JP2004248588A
Publication Date:
December 10, 2008
Filing Date:
August 27, 2004
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP5190425A | ||||
| JP2002222756A | ||||
| JP1094618A | ||||
| JP8227841A | ||||
| JP7058393A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki