Title:
リトグラフ装置、および、デバイスの製造方法
Document Type and Number:
Japanese Patent JP4202996
Kind Code:
B2
Abstract:
A lithographic apparatus comprises a substrate table for holding a substrate; a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a projection system for projecting the patterned beam onto a target portion of a substrate. The projection system and/or radiation system comprise a reflector assembly (100) having a reflector substrate (112) with a reflective surface (111) for reflecting at least a part of inciting radiation and a thermal system (120) capable of transferring heat from at least a part of the reflector substrate (112). The thermal system (120) comprises at least one thermal element (121) present in a recess (113) of the reflector substrate (112) at a side of the reflector substrate (112) opposite to the reflective surface.
Inventors:
Dominicus Jacobs Petrus Adrianis Franken
Application Number:
JP2004294568A
Publication Date:
December 24, 2008
Filing Date:
October 07, 2004
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G02B7/00; G02B7/182; G02B7/198; G03B27/52; G03F7/20; G21K1/06; G21K5/00; G21K5/02
Domestic Patent References:
| JP6308294A | ||||
| JP2003282398A | ||||
| JP2003218023A | ||||
| JP2003172858A | ||||
| JP2001013297A | ||||
| JP9063923A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki