Title:
リソグラフィ装置
Document Type and Number:
Japanese Patent JP4204964
Kind Code:
B2
Abstract:
A lithographic projection apparatus includes a radiation system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to pattern the beam according to a desired pattern. The lithographic projection apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one holding structure includes at least one compliant member holding a pimple plate for holding a removable item for the apparatus.
More Like This:
Inventors:
Know Yang Gilisen
Shored Nicolas Rambertas Dondels
Martinus Hendrix Antonius Reintelth
Shored Nicolas Rambertas Dondels
Martinus Hendrix Antonius Reintelth
Application Number:
JP2003424900A
Publication Date:
January 07, 2009
Filing Date:
December 22, 2003
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20; H01L21/683
Domestic Patent References:
| JP6132388A | ||||
| JP10116760A | ||||
| JP2001326270A | ||||
| JP2002217276A | ||||
| JP2001023886A |
Foreign References:
| US5532903 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki