Title:
プラズマ処理装置
Document Type and Number:
Japanese Patent JP4209612
Kind Code:
B2
Abstract:
A plasma processing apparatus includes a table ( 22 ) on which a processing target (W) is to be placed, a processing vessel ( 11 ) where the table is to be accommodated, and a power feed unit ( 40 ) for supplying a high-frequency electromagnetic field (F) into the processing vessel. The power supply unit includes at least a cylindrical waveguide ( 41 ) for introducing the high-frequency electromagnetic field, and a circular polarization antenna ( 51 ) arranged at one end of the cylindrical waveguide to supply the high-frequency electromagnetic field as a rotating electromagnetic field rotating in a plane perpendicular to its traveling direction. Accordingly, there is no need of providing a circular polarization converter for converting the high-frequency electromagnetic field in the cylindrical waveguide into the rotating electromagnetic field. Consequently, it is possible to solve problems caused by the circular polarization converter, stabilize the operation of plasma generation by performing circular polarization feeding, and perform a continuous operation for a long period of time.
Inventors:
Nobuo Ishii
Application Number:
JP2001385999A
Publication Date:
January 14, 2009
Filing Date:
December 19, 2001
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/3065; H05H1/46; B01J19/08; C23C16/511; H01J37/32; H01L21/205; H01L21/302
Domestic Patent References:
| JP9321031A | ||||
| JP5074592A | ||||
| JP11040394A | ||||
| JP2000306890A |
Foreign References:
| WO2001076329A1 |
Attorney, Agent or Firm:
Masaki Yamakawa
Hiroro Kurokawa
Masayuki Konno
Osamu Nishiyama
Shigeki Yamakawa
Hiroro Kurokawa
Masayuki Konno
Osamu Nishiyama
Shigeki Yamakawa