電子ビーム描画装置

Japanese Patent JP4234242

B2

PROBLEM TO BE SOLVED: To miniaturize and simplify a system while holding the plotting accuracy by forming, contracting, projecting, and deflecting an electron beam, and making each component of an electro-optical system plotting on a sample an electrostatic system. SOLUTION: A first forming aperture 4, an electrostatic lighting lens 20, a first electrostatic forming deflecting device 21, a second forming aperture 7, a second electrostatic forming deflecting device 21, a third aperture 23, an electrostatic contraction lens 24, an electrostatic main deflecting objective lens 25, and an electron detector 12 are arranged on the optical axis of an electron gun 1 of an electron beam plotter device. An electron beam 2 formed into a desired aperture image is radiated so as to form a pattern. Common use of an electrostatic lens or an each component of the electro-optical system and a shield electrode used as an electrostatic deflecting device for an adjoining electrostatic lens and the electrostatic deflecting device can shorten the length of the whole electro-optical system and provide a small-size electron beam plotter device.

Susumu Hashimoto
Atsushi Ando
Kazuka Sugihara
Yusuke Miyoshi
Yuichiro Yamazaki
Hidetoshi Kinoshita
Shigeru Wakayama
Masakazu Hayashi

JP36307198A

March 04, 2009

December 21, 1998

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Toshiba Corporation

H01J37/12; G03F7/20; H01J37/305; H01J37/147; H01L21/027

JP8298247A
JP6177023A
JP5251315A
JP5090144A
JP2005353A
JP4352414A
JP4199613A
JP9162107A
JP59083336A

Takehiko Suzue
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Shoji Kawai

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